Validated substrates
Our thin films grow epitaxially on a broad range of industry‑relevant single‑crystal substrates, including Al2O3 (sapphire), LiNbO3, LiTaO3, GaN, AlN, Si/SiO2, α‑SiO2 (synthetic quartz), and SiC. This substrate coverage spans mainstream semiconductor wafers, high‑frequency RF and microwave platforms, and advanced optical and photonic materials.
These substrates support high‑quality epitaxial growth, enabling multilayer device architectures, magneto‑optical components, and integrated photonic–electronic structures.
Additional substrates can be supported through appropriate matching layers or tailored growth conditions.